FONGSO TECHNOLOGIES. CO.,LTD.

Lithographic Photomask

為半導體的平版印刷遮蔽物

Lithographic photomasks are typically transparent fused silica blanks covered with a pattern defined with a chrome metal absorbing film.

Lithographic photomasks are used at wavelengths of 365 nm,248 nm and 193 nm.

Lithographic photomasks have also been developed for other forms of radiation such as 157 nm, 13.5 nm (Extreme Ultra Violet:EUV), X-ray and electrons and ions.

Diamond membrane is expected for new materials of the photomasks,because diamond has good mechanical strength.That means diamond has high durability against SR (Synchrotron Radiation)exposure with long lifetime,Young's modulus required for accurate pattern positioning.

Photo lithography mask for x-ray

Application
Semiconductor device, Flat panel display and Print circuit board etc.

Price (World market)
1 mask set for 45 nm : 200 million JPY(2)

Reference
(1) Wikipedia : Photomask
(2) weblio Wikipedia